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Total: 3 records, 1 pages
Search For: Copper Based Sputtering Target
Global Copper Based Sputtering Target Market 2024 by Manufacturers, Regions, Type and Application, Forecast to 2030
12 Jan 2024
Electronics & Semiconductor
Copper Based Sputtering Target
According to our (Global Info Research) latest study, the global Copper Based Sputtering Target market size was valued at USD million in 2023 and is forecast to a readjusted size of USD million by 2030 with a CAGR of % during review period.
USD3480.00
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Global Copper Based Sputtering Target Supply, Demand and Key Producers, 2023-2029
11 Feb 2023
Electronics & Semiconductor
Copper Based Sputtering Target
The global Copper Based Sputtering Target market size is expected to reach $ million by 2029, rising at a market growth of % CAGR during the forecast period (2023-2029).
USD4480.00
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Global Copper Based Sputtering Target Market 2023 by Manufacturers, Regions, Type and Application, Forecast to 2029
01 Jan 2023
Electronics & Semiconductor
Copper Based Sputtering Target
First discovered in 1852 and developed as a thin film deposition technique in 1920, sputtering targets are a physical vapor deposition mechanism—an old process, but with many uses in modern technology and manufacturing. The process starts by feeding a substrate (or other item to be coated) into a vacuum chamber containing two magnets. After introducing a controlled gas (such as argon) into the chamber, powerful magnets pull atoms from the substrate.
USD3480.00
Add To Cart
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Search For: Copper Based Sputtering Target
Total: 3 records, 1 pages
According to our (Global Info Research) latest study, the global Copper Based Sputtering Target market size was valued at USD million in 2023 and is forecast to a readjusted size of USD million by 2030 with a CAGR of % during review period.
USD3480.00
Add To Cart
The global Copper Based Sputtering Target market size is expected to reach $ million by 2029, rising at a market growth of % CAGR during the forecast period (2023-2029).
USD4480.00
Add To Cart
First discovered in 1852 and developed as a thin film deposition technique in 1920, sputtering targets are a physical vapor deposition mechanism—an old process, but with many uses in modern technology and manufacturing. The process starts by feeding a substrate (or other item to be coated) into a vacuum chamber containing two magnets. After introducing a controlled gas (such as argon) into the chamber, powerful magnets pull atoms from the substrate.
USD3480.00
Add To Cart
Popular Product Keywords
- We Provide Professional, Accurate Market Analysis to Help You Stay Ahead of Your Competition.Speak to our analyst >>
Our Clients
What We Can Provide?
With better results and higher quality products,Our professional reports can achieve four things:
-
Insight into the industry market information
-
Analyze market development needs
-
Prospects for future development
-
Develop industry investment strategy
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