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Total: 2 records, 1 pages
Search For: CMP Slurry Filters
Global CMP Slurry Filters Market 2024 by Manufacturers, Regions, Type and Application, Forecast to 2030
02 Jan 2024
Electronics & Semiconductor
According to our (Global Info Research) latest study, the global CMP Slurry Filters market size was valued at USD 61 million in 2023 and is forecast to a readjusted size of USD 84 million by 2030 with a CAGR of 4.7% during review period.
USD3480.00
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Global CMP Slurry Filters Market 2023 by Manufacturers, Regions, Type and Application, Forecast to 2029
18 Mar 2023
Electronics & Semiconductor
Chemical mechanical planarization (CMP) is a polishing process used to manufacture wafers for the semiconductor industry. It requires the use of a polishing tool and polishing slurry. The slurry in the tool is delivered to the wafer surface and may contain large particles/agglomerates (> 1 μ) as a result of shipping/handling issues, drying, and interactions within the slurry distribution systems. These large particles can, in turn, increase the level of defectives (scratches) on the semiconductor wafer surface found after the CMP process has been completed. One of the solutions for decreasing the level of defects caused by large slurry particles is through the use of slurry filtration. For these applications, 0.5 to 5 micron filters are typically used.
USD3480.00
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Search For: CMP Slurry Filters
Total: 2 records, 1 pages
According to our (Global Info Research) latest study, the global CMP Slurry Filters market size was valued at USD 61 million in 2023 and is forecast to a readjusted size of USD 84 million by 2030 with a CAGR of 4.7% during review period.
USD3480.00
Add To Cart
Chemical mechanical planarization (CMP) is a polishing process used to manufacture wafers for the semiconductor industry. It requires the use of a polishing tool and polishing slurry. The slurry in the tool is delivered to the wafer surface and may contain large particles/agglomerates (> 1 μ) as a result of shipping/handling issues, drying, and interactions within the slurry distribution systems. These large particles can, in turn, increase the level of defectives (scratches) on the semiconductor wafer surface found after the CMP process has been completed. One of the solutions for decreasing the level of defects caused by large slurry particles is through the use of slurry filtration. For these applications, 0.5 to 5 micron filters are typically used.
USD3480.00
Add To Cart
Popular Product Keywords
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Our Clients
What We Can Provide?
With better results and higher quality products,Our professional reports can achieve four things:
-
Insight into the industry market information
-
Analyze market development needs
-
Prospects for future development
-
Develop industry investment strategy
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