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The global Nanoimprint Lithography System market size is expected to reach $ 164.1 million by 2030, rising at a market growth of 7.8% CAGR during the forecast period (2024-2030).

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According to our (Global Info Research) latest study, the global Nanoimprint Lithography System market size was valued at USD 96.7 million in 2023 and is forecast to a readjusted size of USD 164.1 million by 2030 with a CAGR of 7.8% during review period.

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Imprinting technology is an ancient technique for the reproduction of writings on appropriate supports. Since 1990´s, one of the imprinting techniques, i.e., injection moulding has been used for compact disk (CD) production. More recently, the semiconductor industry is interested in imprint related techniques because of the mass production requirement of future microelectronic circuits with a possible critical dimension down to a few nanometers. At this deep nanometer scale, traditional photolithography is supposed to rule out because of the optical diffraction or material limitations. In fact, the actual minimum feature size in an integrated circuit (IC) is already less than 50 nm and the actual manufacturing systems are already extremely sophisticated and expensive. The semiconductor industry has always been looking for alternative patterning methods in order to follow Moore´s law, which has been formulated to predict the evolution of the technology nodes. Now, extreme UV lithography (EUV), 193 nm immersion lithography, mask less lithography (MLL) techniques and nanoimprint lithography (NIL) are considered as candidates for the so called Next Generation Lithography (NGL) at 32 nm and 22 nm nodes. In parallel, imprint technology has been promoted by a large scientific community and non-IC industry segments including high-density storage, optoelectronics, telecommunication as well as biochips or micro total analysis systems.

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