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Global PVD Vacuum Coating Machine Market 2024 by Manufacturers, Regions, Type and Application, Forecast to 2030

date 02 Jan 2024

date Electronics & Semiconductor

new_biaoQian PVD Vacuum Coating Machine

According to our (Global Info Research) latest study, the global PVD Vacuum Coating Machine market size was valued at USD 3812.5 million in 2023 and is forecast to a readjusted size of USD 4943.3 million by 2030 with a CAGR of 3.8% during review period.

USD3480.00

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Global PVD Vacuum Coating Machine Market 2023 by Manufacturers, Regions, Type and Application, Forecast to 2029

date 18 Mar 2023

date Electronics & Semiconductor

new_biaoQian PVD Vacuum Coating Machine

PVD (Physical Vapor Deposition) technology is one of the main technologies for preparing thin film materials. Physical methods are used under vacuum conditions to vaporize a material into gaseous atoms, molecules or partial ionization into ions, and pass through low-pressure gas (or plasma) process, depositing thin film materials to achieve special functions such as anti-reflection, reflection, protection, conduction, magnetic permeability, insulation, corrosion resistance, oxidation resistance, radiation protection, decoration, etc. on the surface of the substrate material. The substances used to prepare thin film materials are called PVD coating materials. Sputtering coating and vacuum evaporation coating are the two most mainstream PVD coating methods.

USD3480.00

Add To Cart

Add To Cart

industry 02 Jan 2024

industry Electronics & Semiconductor

new_biaoQian PVD Vacuum Coating Machine

According to our (Global Info Research) latest study, the global PVD Vacuum Coating Machine market size was valued at USD 3812.5 million in 2023 and is forecast to a readjusted size of USD 4943.3 million by 2030 with a CAGR of 3.8% during review period.

USD3480.00

addToCart

Add To Cart

industry 18 Mar 2023

industry Electronics & Semiconductor

new_biaoQian PVD Vacuum Coating Machine

PVD (Physical Vapor Deposition) technology is one of the main technologies for preparing thin film materials. Physical methods are used under vacuum conditions to vaporize a material into gaseous atoms, molecules or partial ionization into ions, and pass through low-pressure gas (or plasma) process, depositing thin film materials to achieve special functions such as anti-reflection, reflection, protection, conduction, magnetic permeability, insulation, corrosion resistance, oxidation resistance, radiation protection, decoration, etc. on the surface of the substrate material. The substances used to prepare thin film materials are called PVD coating materials. Sputtering coating and vacuum evaporation coating are the two most mainstream PVD coating methods.

USD3480.00

addToCart

Add To Cart