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Total: 3 records, 1 pages

Global Photomask Blank Supply, Demand and Key Producers, 2024-2030

date 02 Mar 2024

date Electronics & Semiconductor

new_biaoQian Photomask Blank

The global Photomask Blank market size is expected to reach $ million by 2030, rising at a market growth of % CAGR during the forecast period (2024-2030).

USD4480.00

Add To Cart

Add To Cart

Global Photomask Blank Market 2024 by Manufacturers, Regions, Type and Application, Forecast to 2030

date 09 Jan 2024

date Electronics & Semiconductor

new_biaoQian Photomask Blank

According to our (Global Info Research) latest study, the global Photomask Blank market size was valued at USD million in 2023 and is forecast to a readjusted size of USD million by 2030 with a CAGR of % during review period.

USD3480.00

Add To Cart

Add To Cart

Global Photomask Blank Market 2023 by Manufacturers, Regions, Type and Application, Forecast to 2029

date 10 Jan 2023

date Electronics & Semiconductor

new_biaoQian Photomask Blank

Photomask Blank are the products which are formed from a chrome or molybdenum silicide based thin film on mainly quartz or soda-lime glass substrate. And they are coated by photosensitive resist materials which sensitive for electron or laser beam and resist for etching process to make circuit patterns.

USD3480.00

Add To Cart

Add To Cart

industry 02 Mar 2024

industry Electronics & Semiconductor

new_biaoQian Photomask Blank

The global Photomask Blank market size is expected to reach $ million by 2030, rising at a market growth of % CAGR during the forecast period (2024-2030).

USD4480.00

addToCart

Add To Cart

industry 09 Jan 2024

industry Electronics & Semiconductor

new_biaoQian Photomask Blank

According to our (Global Info Research) latest study, the global Photomask Blank market size was valued at USD million in 2023 and is forecast to a readjusted size of USD million by 2030 with a CAGR of % during review period.

USD3480.00

addToCart

Add To Cart

industry 10 Jan 2023

industry Electronics & Semiconductor

new_biaoQian Photomask Blank

Photomask Blank are the products which are formed from a chrome or molybdenum silicide based thin film on mainly quartz or soda-lime glass substrate. And they are coated by photosensitive resist materials which sensitive for electron or laser beam and resist for etching process to make circuit patterns.

USD3480.00

addToCart

Add To Cart