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Total: 2 records, 1 pages

Global Planar Copper Target Market 2024 by Manufacturers, Regions, Type and Application, Forecast to 2030

date 21 Aug 2024

date Chemical & Material

new_biaoQian Planar Copper Target

Planar copper target is a material target used in sputtering deposition process, which is widely used in semiconductor, display, solar cell and other thin film manufacturing fields. Sputtering is a physical vapor deposition method. Planar copper target is used as sputtering source. In a high vacuum environment, copper atoms are sputtered from the target surface to the substrate through ion bombardment to form a uniform thin film.

USD3480.00

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Global Planar Copper Target Supply, Demand and Key Producers, 2024-2030

date 21 Aug 2024

date Chemical & Material

new_biaoQian Planar Copper Target

Planar copper target is a material target used in sputtering deposition process, which is widely used in semiconductor, display, solar cell and other thin film manufacturing fields. Sputtering is a physical vapor deposition method. Planar copper target is used as sputtering source. In a high vacuum environment, copper atoms are sputtered from the target surface to the substrate through ion bombardment to form a uniform thin film.

USD4480.00

Add To Cart

Add To Cart

industry 21 Aug 2024

industry Chemical & Material

new_biaoQian Planar Copper Target

Planar copper target is a material target used in sputtering deposition process, which is widely used in semiconductor, display, solar cell and other thin film manufacturing fields. Sputtering is a physical vapor deposition method. Planar copper target is used as sputtering source. In a high vacuum environment, copper atoms are sputtered from the target surface to the substrate through ion bombardment to form a uniform thin film.

USD3480.00

addToCart

Add To Cart

industry 21 Aug 2024

industry Chemical & Material

new_biaoQian Planar Copper Target

Planar copper target is a material target used in sputtering deposition process, which is widely used in semiconductor, display, solar cell and other thin film manufacturing fields. Sputtering is a physical vapor deposition method. Planar copper target is used as sputtering source. In a high vacuum environment, copper atoms are sputtered from the target surface to the substrate through ion bombardment to form a uniform thin film.

USD4480.00

addToCart

Add To Cart