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Total: 2 records, 1 pages
Search For: Semiconductor Ion Implantation Equipment
Global Semiconductor Ion Implantation Equipment Market 2024 by Manufacturers, Regions, Type and Application, Forecast to 2030
09 Oct 2024
Machinery & Equipment
Semiconductor Ion Implantation Equipment
Semiconductor ion implantation equipment is a key piece of equipment used in the fabrication of semiconductor devices to inject specific types of ions (e.g., boron, phosphorus, silicon, etc.) onto the surface of semiconductor wafers in order to change their electrical properties. This equipment achieves doping by accelerating the ions to high energies and directing them into the semiconductor wafer through an electric field. The doping process changes the conductivity and resistivity of the semiconductor wafer to give it the desired electrical properties.
USD3480.00
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Global Semiconductor Ion Implantation Equipment Supply, Demand and Key Producers, 2024-2030
09 Oct 2024
Machinery & Equipment
Semiconductor Ion Implantation Equipment
Semiconductor ion implantation equipment is a key piece of equipment used in the fabrication of semiconductor devices to inject specific types of ions (e.g., boron, phosphorus, silicon, etc.) onto the surface of semiconductor wafers in order to change their electrical properties. This equipment achieves doping by accelerating the ions to high energies and directing them into the semiconductor wafer through an electric field. The doping process changes the conductivity and resistivity of the semiconductor wafer to give it the desired electrical properties.
USD4480.00
Add To Cart
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Search For: Semiconductor Ion Implantation Equipment
Total: 2 records, 1 pages
Semiconductor ion implantation equipment is a key piece of equipment used in the fabrication of semiconductor devices to inject specific types of ions (e.g., boron, phosphorus, silicon, etc.) onto the surface of semiconductor wafers in order to change their electrical properties. This equipment achieves doping by accelerating the ions to high energies and directing them into the semiconductor wafer through an electric field. The doping process changes the conductivity and resistivity of the semiconductor wafer to give it the desired electrical properties.
USD3480.00
Add To Cart
Semiconductor ion implantation equipment is a key piece of equipment used in the fabrication of semiconductor devices to inject specific types of ions (e.g., boron, phosphorus, silicon, etc.) onto the surface of semiconductor wafers in order to change their electrical properties. This equipment achieves doping by accelerating the ions to high energies and directing them into the semiconductor wafer through an electric field. The doping process changes the conductivity and resistivity of the semiconductor wafer to give it the desired electrical properties.
USD4480.00
Add To Cart
Popular Product Keywords
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Our Clients
What We Can Provide?
With better results and higher quality products,Our professional reports can achieve four things:
-
Insight into the industry market information
-
Analyze market development needs
-
Prospects for future development
-
Develop industry investment strategy
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