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Total: 3 records, 1 pages
Search For: TFT-LCD Photomask
Global TFT-LCD Photomask Supply, Demand and Key Producers, 2024-2030
19 Feb 2024
Chemical & Material
The global TFT-LCD Photomask market size is expected to reach $ 1306.3 million by 2030, rising at a market growth of 2.3% CAGR during the forecast period (2024-2030).
USD4480.00
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Global TFT-LCD Photomask Market 2024 by Manufacturers, Regions, Type and Application, Forecast to 2030
02 Jan 2024
Chemical & Material
According to our (Global Info Research) latest study, the global TFT-LCD Photomask market size was valued at USD 1114.4 million in 2023 and is forecast to a readjusted size of USD 1306.3 million by 2030 with a CAGR of 2.3% during review period.
USD3480.00
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Global TFT-LCD Photomask Market 2023 by Manufacturers, Regions, Type and Application, Forecast to 2029
18 Mar 2023
Chemical & Material
TFT-LCD Photomask market. Photomask consists of a fused silica (QZ) or, glass (SL) substrate coated with an opaque film, in to which an accurate replication of the device designer’s pattern is etched. Photomask has a similar function as a film used in photography. Just like the identical pictures are printed from the film, photomask can reproduce thousands of circuits and patterns. The photolithography technique is employed in the photomask manufacturing process to create chrome pattern on a quartz substrate. The finished photomask is then used as photographic plates for LSI, LCD, PCB, etc.
USD3480.00
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Search For: TFT-LCD Photomask
Total: 3 records, 1 pages
The global TFT-LCD Photomask market size is expected to reach $ 1306.3 million by 2030, rising at a market growth of 2.3% CAGR during the forecast period (2024-2030).
USD4480.00
Add To Cart
According to our (Global Info Research) latest study, the global TFT-LCD Photomask market size was valued at USD 1114.4 million in 2023 and is forecast to a readjusted size of USD 1306.3 million by 2030 with a CAGR of 2.3% during review period.
USD3480.00
Add To Cart
TFT-LCD Photomask market. Photomask consists of a fused silica (QZ) or, glass (SL) substrate coated with an opaque film, in to which an accurate replication of the device designer’s pattern is etched. Photomask has a similar function as a film used in photography. Just like the identical pictures are printed from the film, photomask can reproduce thousands of circuits and patterns. The photolithography technique is employed in the photomask manufacturing process to create chrome pattern on a quartz substrate. The finished photomask is then used as photographic plates for LSI, LCD, PCB, etc.
USD3480.00
Add To Cart
Popular Product Keywords
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Our Clients
What We Can Provide?
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Analyze market development needs
-
Prospects for future development
-
Develop industry investment strategy
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