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Global Ultra High Purity Colloidal Silica CMP Abrasives Market 2024 by Manufacturers, Regions, Type and Application, Forecast to 2030

date 23 Aug 2024

date Chemical & Material

new_biaoQian Ultra High Purity Colloidal Silica CMP Abrasives

Ultra High Purity Colloidal Silica CMP Abrasives are the most widely used water-glass colloidal silica products for CMP of semiconductor devices, interlayer dielectrics, shallow trench isolation, polysilicon, and post-metal buff. The silica particles are grown in a liquid medium and maintain excellent stability.

USD3480.00

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Global Ultra High Purity Colloidal Silica CMP Abrasives Supply, Demand and Key Producers, 2024-2030

date 23 Aug 2024

date Chemical & Material

new_biaoQian Ultra High Purity Colloidal Silica CMP Abrasives

Ultra High Purity Colloidal Silica CMP Abrasives are the most widely used water-glass colloidal silica products for CMP of semiconductor devices, interlayer dielectrics, shallow trench isolation, polysilicon, and post-metal buff. The silica particles are grown in a liquid medium and maintain excellent stability.

USD4480.00

Add To Cart

Add To Cart

Ultra High Purity Colloidal Silica CMP Abrasives are the most widely used water-glass colloidal silica products for CMP of semiconductor devices, interlayer dielectrics, shallow trench isolation, polysilicon, and post-metal buff. The silica particles are grown in a liquid medium and maintain excellent stability.

USD3480.00

addToCart

Add To Cart

Ultra High Purity Colloidal Silica CMP Abrasives are the most widely used water-glass colloidal silica products for CMP of semiconductor devices, interlayer dielectrics, shallow trench isolation, polysilicon, and post-metal buff. The silica particles are grown in a liquid medium and maintain excellent stability.

USD4480.00

addToCart

Add To Cart